J. Phys. III France 6 (1996) 1435-1439
Secondary Electron Imaging by Means of a Microfabricated Electron ColumnC. Stebler1, M. Despont2 and U. Staufer1
1 Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
2 Present address: IBM Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland
(Received 4 June 1996, accepted 19 September 1996)
This letter reports about the application of a miniaturized electron microscope for generating scanning secondary-electron images. The employed electrostatic lens-system was fabricated using silicon microfabrication techniques and a scanning tunneling microscope, operated in the field emission mode, was used as electron source. A resolution of better than 100 nm at a beam energy of 200 eV was achieved.
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