Issue J. Phys. III France Volume 6, Number 11, November 1996 Page(s) 1435 - 1439 DOI 10.1051/jp3:1996106

DOI: 10.1051/jp3:1996106
J. Phys. III France 6 (1996) 1435-1439

Secondary Electron Imaging by Means of a Microfabricated Electron Column

C. Stebler¹, M. Despont² and U. Staufer<sup>1

1</sup>  Institute of Physics, University of Basel, Klingelbergstrasse 82, 4056 Basel, Switzerland
²  Present address: IBM Research Laboratory, Säumerstrasse 4, 8803 Rüschlikon, Switzerland

(Received 4 June 1996, accepted 19 September 1996)

Abstract
This letter reports about the application of a miniaturized electron microscope for generating scanning secondary-electron images. The employed electrostatic lens-system was fabricated using silicon microfabrication techniques and a scanning tunneling microscope, operated in the field emission mode, was used as electron source. A resolution of better than 100 nm at a beam energy of 200 eV was achieved.

© Les Editions de Physique 1996

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