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Plasma depostion of BN, BCN:H and Me-BCN:H films using N-trimethylborazine (Me = Ti, Nb)

A. Weber, U. Bringmann, C.P. Klages, K. Taube, G. Döllein, H. Meyer, G. Weidenbach

J. Phys. III France, 2 8 (1992) 1391-1398

DOI: https://doi.org/10.1051/jp3:1992184

Citations de cet article :

Boron carbonitride coatings synthesized by LPCVD, structure and properties

G. Puyoo, F. Teyssandier, R. Pailler, C. Labrugère and G. Chollon
Carbon 122 19 (2017)
https://doi.org/10.1016/j.carbon.2017.06.024

Optical and electrical characteristics of plasma enhanced chemical vapor deposition boron carbonitride thin films derived from N-trimethylborazine precursor

Veronica S. Sulyaeva, Marina L. Kosinova, Yurii M. Rumyantsev, et al.
Thin Solid Films 558 112 (2014)
https://doi.org/10.1016/j.tsf.2014.02.082

Properties of BC x N y films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures

V. S. Sulyaeva, M. L. Kosinova, Yu. M. Rumyantsev, et al.
Inorganic Materials 46 (5) 487 (2010)
https://doi.org/10.1134/S0020168510050092

Speciation of BC x N y films grown by PECVD with trimethylborazine precursor

Olaf Baake, Peter S. Hoffmann, Andreas Klein, et al.
Analytical and Bioanalytical Chemistry 395 (6) 1901 (2009)
https://doi.org/10.1007/s00216-009-3056-6

Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization

V.S. Sulyaeva, Yu.M. Rumyantsev, M.L. Kosinova, et al.
Surface and Coatings Technology 201 (22-23) 9009 (2007)
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The growth of hexagonal boron nitride thin films on silicon using single source precursor

C Rohr, J.-H Boo and W Ho
Thin Solid Films 322 (1-2) 9 (1998)
https://doi.org/10.1016/S0040-6090(97)01007-9

Low energy kinetic threshold in the growth of cubic boron nitride films

S. Kidner, C. A. Taylor and Roy Clarke
Applied Physics Letters 64 (14) 1859 (1994)
https://doi.org/10.1063/1.111779