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Article cité :
A.M. Diamy , J.C. Legrand , V. Hrachová
J. Phys. III France, 5 4 (1995) 435-445
Citations de cet article :
7 articles
Comparison between Langmuir probe and microwave autointerferometry measurements at intermediate pressure in an argon surface wave discharge
A. Rousseau, E. Teboul and S. Béchu Journal of Applied Physics 98 (8) 083306 (2005) https://doi.org/10.1063/1.2112172
Influence of C atom concentration for acetylene production in a CH4/N2 afterglow
A.-M. Diamy, R. Hrach, V. Hrachová and J.-C. Legrand Vacuum 61 (2-4) 403 (2001) https://doi.org/10.1016/S0042-207X(01)00151-8
A spatially resolved plasma diagnostic in an expanding microwave discharge containing an Ar- gas mixture: uniformity and stability of the discharge
J L Jauberteau, M J Cinelli, I Jauberteau and J Aubreton Journal of Physics D: Applied Physics 32 (4) 445 (1999) https://doi.org/10.1088/0022-3727/32/4/015
Measurements by optical and mass spectrometry of the density of active species in the flowing afterglow of a N2/(10−4–10−3)CH4 plasma
A.-M Diamy, J.-C Legrand, A Moritts and A Ricard Surface and Coatings Technology 112 (1-3) 38 (1999) https://doi.org/10.1016/S0257-8972(98)00612-4
Kinetics of reactions in CH4\N2 afterglow plasma : a simplified model
J-C Legrand, A-M Diamy, R Hrach, V Hrachová and reactib Vacuum 50 (3-4) 491 (1998) https://doi.org/10.1016/S0042-207X(98)00085-2
Methane Conversion in the Flowing Afterglow of a Dinitrogen Microwave Plasma: Initiation of the Reaction
J.‐C. Legrand, A.‐M. Diamy, R. Hrach and V. Hrachova Contributions to Plasma Physics 37 (6) 521 (1997) https://doi.org/10.1002/ctpp.2150370606
Kinetics of reactions in afterglow plasma
JC Legrand, AM Diamy, R Hrach and V Hrachová Vacuum 48 (7-9) 671 (1997) https://doi.org/10.1016/S0042-207X(97)00066-3