Plasma depostion of BN, BCN:H and Me-BCN:H films using N-trimethylborazine (Me = Ti, Nb) A. Weber, U. Bringmann, C.P. Klages, K. Taube, G. Döllein, H. Meyer et G. WeidenbachJ. Phys. III France, 2 8 (1992) 1391-1398DOI: https://doi.org/10.1051/jp3:1992184
