Selective and epitaxial deposition of β-FeSi2 onto silicon by RTP-CVD J.L. Regolini, F. Trincat, I. Berbezier, J. Palleau, J. Mercier et D. BensahelJ. Phys. III France, 2 8 (1992) 1445-1452DOI: https://doi.org/10.1051/jp3:1992189
