Plasma diagnostics of rf discharges used for the deposition of hydrogenated amorphous carbon coatings J. Smeets, V. Van den Bergh, R. Jacobs, L. Eersels, J. Meneve et E. DekempeneerJ. Phys. III France, 2 8 (1992) 1461-1468DOI: https://doi.org/10.1051/jp3:1992191
