Annealing-related electrical and piezoresistive properties of Band As-implanted LPCVD silicon films P. Jeanjean, J. Sicart, J. L. Robert, M. Le Berre, P. Pinard et V. ConederaJ. Phys. III France, 3 1 (1993) 47-53DOI: https://doi.org/10.1051/jp3:1993119
