Hydrodynamic and Chemical Modeling of a Chemical Vapor Deposition Reactor for Zirconia DepositionT. Belmonte, J. Gavillet, T. Czerwiec, D. Ablitzer et H. MichelJ. Phys. III France, 7 9 (1997) 1779-1796DOI: https://doi.org/10.1051/jp3:1997222
