Journal de Physique III

Evaluation de l'influence d'un procédé LOCOS sur la génération interfaciale des transistors NMOS

R. Jérisian, J. Oualid, J. Dugas and J. M. Mirabel

J. Phys. III France, 1 7 (1991) 1311-1321

DOI: 10.1051/jp3:1991191

R. Jérisian

J. Oualid

J. Dugas

J. M. Mirabel

Articles written by ALL the selected authors (AND)

Articles written by ANY OF the selected authors (OR)