Journal de Physique III

Hydrodynamic and Chemical Modeling of a Chemical Vapor Deposition Reactor for Zirconia Deposition

T. Belmonte, J. Gavillet, T. Czerwiec, D. Ablitzer and H. Michel

J. Phys. III France, 7 9 (1997) 1779-1796

DOI: 10.1051/jp3:1997222

T. Belmonte

J. Gavillet

T. Czerwiec

D. Ablitzer

H. Michel

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