Articles citing this article

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Cited article:

Quantitative study of charge trapping in SiO2 during bipolar Fowler–Nordheim injection

C. Busseret, N. Baboux, C. Plossu, S. Burignat and P. Boivin
Journal of Non-Crystalline Solids 322 (1-3) 191 (2003)
https://doi.org/10.1016/S0022-3093(03)00201-1

Characterisation of charge trapping at the Si–SiO2 (100) interface using high-temperature conductance spectroscopy

E Duval and E Lheurette
Microelectronic Engineering 65 (1-2) 103 (2003)
https://doi.org/10.1016/S0167-9317(02)00732-3

Effect of defects localised in the oxide of submicrometer NMOS transistor on substrate and drain currents

A. Bouhdada, A. Nouacry, S. Bakkali, A. Touhami and R. Marrakh
Microelectronics Journal 30 (1) 19 (1999)
https://doi.org/10.1016/S0026-2692(98)00073-1