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Cited article:
A. Weber , U. Bringmann , C.P. Klages , K. Taube , G. Döllein , H. Meyer , G. Weidenbach
J. Phys. III France, 2 8 (1992) 1391-1398
This article has been cited by the following article(s):
7 articles
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Properties of BC x N y films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures
V. S. Sulyaeva, M. L. Kosinova, Yu. M. Rumyantsev, et al. Inorganic Materials 46 (5) 487 (2010) https://doi.org/10.1134/S0020168510050092
Speciation of BC x N y films grown by PECVD with trimethylborazine precursor
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Plasma enhanced chemical vapour deposition of BCxNy films prepared from N-trimethylborazine: Modelling, synthesis and characterization
V.S. Sulyaeva, Yu.M. Rumyantsev, M.L. Kosinova, et al. Surface and Coatings Technology 201 (22-23) 9009 (2007) https://doi.org/10.1016/j.surfcoat.2007.04.016
The growth of hexagonal boron nitride thin films on silicon using single source precursor
C Rohr, J.-H Boo and W Ho Thin Solid Films 322 (1-2) 9 (1998) https://doi.org/10.1016/S0040-6090(97)01007-9
Low energy kinetic threshold in the growth of cubic boron nitride films
S. Kidner, C. A. Taylor and Roy Clarke Applied Physics Letters 64 (14) 1859 (1994) https://doi.org/10.1063/1.111779