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Cited article:

Remote plasma chemical vapour deposition of silicon nitride films

S.E. Alexandrov, A. Yu. Kovalgin

J. Phys. III France, 2 8 (1992) 1421-1429

DOI: https://doi.org/10.1051/jp3:1992186

This article has been cited by the following article(s):

Hydrogen incorporation in silicon nitride films deposited by remote electron‐cyclotron‐resonance chemical vapor deposition

David E. Kotecki and Jonathan D. Chapple‐Sokol
Journal of Applied Physics 77 (3) 1284 (1995)
https://doi.org/10.1063/1.358930

Formation of silicon nitride films by remote plasma‐enhanced chemical vapour deposition

Sergei E. Alexandrov, Michael L. Hitchman and Sarkis Shamlian
Advanced Materials for Optics and Electronics 2 (6) 301 (1993)
https://doi.org/10.1002/amo.860020605