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Cited article:

Plasma diagnostics of rf discharges used for the deposition of hydrogenated amorphous carbon coatings

J. Smeets, V. Van den Bergh, R. Jacobs, L. Eersels, J. Meneve, E. Dekempeneer

J. Phys. III France, 2 8 (1992) 1461-1468

DOI: https://doi.org/10.1051/jp3:1992191

This article has been cited by the following article(s):

Spatially resolved atomic excitation temperatures in CH4/H2and C3H8/H2RF discharges by optical emission spectroscopy

A Chingsungnoen, J I B Wilson, V Amornkitbamrung, C Thomas and T Burinprakhon
Plasma Sources Science and Technology 16 (3) 434 (2007)
https://doi.org/10.1088/0963-0252/16/3/002

Plasma processes in methane discharges during r.f. plasma-assisted chemical vapour deposition of a-C:H thin films

E.H.A. Dekempeneer, J. Smeets, J. Meneve, L. Eersels and R. Jacobs
Thin Solid Films 241 (1-2) 269 (1994)
https://doi.org/10.1016/0040-6090(94)90439-1