Articles citing this article

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Cited article:

Matériaux céramiques déposés en couches minces par plasma CVD

B. Cros, E. Gat, J. Durand, L. Cot

J. Phys. III France, 3 4 (1993) 729-744

DOI: https://doi.org/10.1051/jp3:1993159

This article has been cited by the following article(s):

Characterization of the chemical bond in novel materials by the study of the acoustic signature

B Cros, J.Y Ferrandis and G Despaux
Sensors and Actuators B: Chemical 76 (1-3) 108 (2001)
https://doi.org/10.1016/S0925-4005(01)00595-0

Influence of the substrate temperature on silicon–carbon thin films deposited from SiH4 and C2H4 by excimer lamp–CVD

X Redondas, P González, B León and M Pérez-Amor
Thin Solid Films 317 (1-2) 112 (1998)
https://doi.org/10.1016/S0040-6090(97)00601-9

Photochemical vapour deposition of hydrogenated amorphous silicon-carbon thin films by using a Xe2* excimer lamp

X Redondas
Applied Surface Science 106 55 (1996)
https://doi.org/10.1016/S0169-4332(96)00377-7