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Cited article:

Fabrication of Buried Co-Planar Metal-Insulator-Metal Nanojunctions with a Gap Lower than 10 nm

V. Rousset, C. Joachim, S. Itoua, B. Rousset, N. Fabre

J. Phys. III France, 5 12 (1995) 1983-1989

DOI: https://doi.org/10.1051/jp3:1995243

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