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H2 Mole Fraction Measurements in a Microwave Plasma Using Coherent Anti-Stokes Raman Scattering Spectroscopy
Alfredo D. Tuesta, Aizaz Bhuiyan, Robert P. Lucht and Timothy S. Fisher Journal of Micro and Nano-Manufacturing 4(1) (2016) https://doi.org/10.1115/1.4031916
Spectroscopic study of H2microwave plasmas with small admixtures of CH4and B2H6used for doped diamond deposition
Measurement and modeling of Ar∕H2∕CH4 arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C2, and CH radical densities
Effects of Pulsed Microwave Plasmas on Diamond Deposition
Guillaume Lombardi, Xavier Duten, Khaled Hassouni, Antoine Rousseau and Alix Gicquel Journal of The Electrochemical Society 150(5) C311 (2003) https://doi.org/10.1149/1.1562934
Time-resolved measurements of the gas temperature in a H2/CH4 medium pressure microwave 915 MHz pulsed plasma
Xavier Duten, Antoine Rousseau, Alix Gicquel, Khaled Hassouni and Philippe Leprince Journal of Physics D: Applied Physics 35(16) 1939 (2002) https://doi.org/10.1088/0022-3727/35/16/307
Luminescence study of polycrystalline CVD diamond films containing a small amount of nitrogen
Rotational temperature measurements of excited and ground states of C[sub 2](d [sup 3]Πg−a [sup 3]Πu) transition in a H[sub 2]/CH[sub 4] 915 MHz microwave pulsed plasma
Xavier Duten, Antoine Rousseau, Alix Gicquel and Philippe Leprince Journal of Applied Physics 86(9) 5299 (1999) https://doi.org/10.1063/1.371515
Chemical kinetics and energy transfer in moderate pressure H2plasmas used in diamond MPACVD processes
Etude par spectroscopie d'emission optique de decharges radiofrequence et micro-onde lors du depot chimique en phase vapeur (PACVD) dans le systeme Si-C-H-Ar