Journal de Physique III

Mechanisms and rate determining steps in plasma induced high rate CVD of silicon an germanium: similarities and differences

S. Vepřek, M.G.J. Vepřek-heijman, O. Ambacher, M. Rückschloss, F. Glatz and R. Konwitschny

J. Phys. III France, 2 8 (1992) 1431-1438

DOI: 10.1051/jp3:1992187

S. Vepřek

M.G.J. Vepřek-heijman

O. Ambacher

M. Rückschloss

F. Glatz

R. Konwitschny

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