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Effect of energetic ions on plasma damage of porous SiCOH low-k materials
E. Kunnen, M. R. Baklanov, A. Franquet, et al. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 28(3) 450 (2010) https://doi.org/10.1116/1.3372838
In-Situ Surface Recombination Measurements of Oxygen Atoms on Anodized Aluminum in an Oxygen Plasma
Joydeep Guha, Peter Kurunczi, Luc Stafford, Vincent M. Donnelly and Yi-Kang Pu The Journal of Physical Chemistry C 112(24) 8963 (2008) https://doi.org/10.1021/jp800788a
Atomic oxygen surface loss probability on silica in microwave plasmas studied by a pulsed induced fluorescence technique
Discharged generator of singlet oxygen for oxygen-iodine laser. Transport kinetics of O2(a 1δg) and O2(b 1σ g + ) molecules and O(3 P) atoms in Ar:O2 and He:O2 flows excited by a 13.56-MHz discharge
Etching mechanisms of Si and SiO2in fluorocarbon ICP plasmas: analysis of the plasma by mass spectrometry, Langmuir probe and optical emission spectroscopy
DC pulsed plasma surface treatment of polystyrene thin films with nitrogen: study of the correlation between energy distribution and wettability
J. Larrieu, B. Held, F. Clément, N. Soulem and D. Dubois The European Physical Journal Applied Physics 26(2) 113 (2004) https://doi.org/10.1051/epjap:2004024
Study of oxygen atom recombination on a Pyrex surface at different wall temperatures by means of time-resolved actinometry in a double pulse discharge technique
Comparison of NO titration and fiber optics catalytic probes for determination of neutral oxygen atom concentration in plasmas and postglows
Miran Mozetič, Andre Ricard, Dušan Babič, et al. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21(2) 369 (2003) https://doi.org/10.1116/1.1539082
Polystyrene thin films treatment under DC pulsed discharges conditions in nitrogen-argon and oxygen-argon mixtures
Nonlocal nature of the electron energy spectrum in a glow-discharge in pure O2: II. Actinometry of O(3 P) atoms in a plasma at low gas pressures
V. V. Ivanov, K. S. Klopovskii, D. V. Lopaev, A. T. Rakhimov and T. V. Rakhimova Plasma Physics Reports 26(11) 980 (2000) https://doi.org/10.1134/1.1323563
Plasma Kinetics in Atmospheric Gases
Mario Capitelli, Carlos M. Ferreira, Boris F. Gordiets and Alexey I. Osipov Springer Series on Atomic, Optical, and Plasma Physics, Plasma Kinetics in Atmospheric Gases 31 193 (2000) https://doi.org/10.1007/978-3-662-04158-1_12
Atomic oxygen recombination on fused silica: modelling and comparison to low-temperature experiments (300 K)*
Time resolved O2(b $^1\Sigma^+_g$) rotational temperature measurements in a low-pressure oxygen pulsed discharge. Simple and quick method for temperature determination
Low temperature zirconia thin film synthesis by a chemical vapour deposition process involving ZrCl4 and O2–H2–Ar microwave post-discharges. Comparison with a conventional CVD hydrolysis process