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Article cité :

Interest of Pulsed and Modulated dc Discharges for Depositing Insulating Compounds by Reactive Magnetron Sputtering

A. Billard, C. Frantz

J. Phys. III France, 6 9 (1996) 1181-1187

DOI: https://doi.org/10.1051/jp3:1996177

Citations de cet article :

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

W. Gulbiński
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies 309 (2002)
https://doi.org/10.1007/978-94-010-0353-7_13

Synthesis of stoichiometric zirconium nitride by d.c. reactive magnetron sputtering pulsed at low frequency: characterization by ESCA, SIMS and electron microprobe

J. P. Dauchot, R. Gouttebaron, D. Cornelissen, M. Wautelet and M. Hecq
Surface and Interface Analysis 30 (1) 607 (2000)
https://doi.org/10.1002/1096-9918(200008)30:1<607::AID-SIA860>3.0.CO;2-6

Enhanced deposition rate of high quality stoichiometric ceramic compounds reactively sputter deposited at low pressure by modulating the discharge current at low frequency

D. Mercs, F. Lapostolle, F. Perry, A. Billard and C. Frantz
Surface and Coatings Technology 116-119 916 (1999)
https://doi.org/10.1016/S0257-8972(99)00262-5

Enhanced deposition rate of d.c. reactively sputtered TiO2 films by means of low-frequency modulation of the discharge current

F. Lapostolle, Tran Huu Loı̈, A. Billard and C. Frantz
Surface and Coatings Technology 97 (1-3) 574 (1997)
https://doi.org/10.1016/S0257-8972(97)00177-1

An investigation of the pulse characteristics on deposition rate of reactively sputtered titanium dioxide films synthesised with a low-frequency modulation of the discharge current

F. Perry, A. Billard and C. Frantz
Surface and Coatings Technology 94-95 339 (1997)
https://doi.org/10.1016/S0257-8972(97)00457-X