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Cited article:
K. Hassouni , S. Farhat , C.D. Scott , A. Gicquel
J. Phys. III France, 6 9 (1996) 1229-1243
This article has been cited by the following article(s):
24 articles
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Comprehensive Hard Materials
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Infrared spectroscopic and modeling studies of H2/CH4 microwave plasma gas phase from low to high pressure and power
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Hydrodynamics effects in high power density microwave plasma diamond growth reactors
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Thick boron doped diamond single crystals for high power electronics
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Modelling of diamond deposition microwave cavity generated plasmas
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High quality MPACVD diamond single crystal growth: high microwave power density regime
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Simplified description of microwave plasma discharge for chemical vapor deposition of diamond
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Gas temperature determination using BH (0–0)A 1Π →X 1Σ+emission spectrum in a B2H6containing plasma for doped diamond deposition
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Investigation of chemical kinetics and energy transfer in a pulsed microwave H2/CH4plasma
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Chemical kinetics and energy transfer in moderate pressure H2plasmas used in diamond MPACVD processes
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Self-consistent microwave field and plasma discharge simulations for a moderate pressure hydrogen discharge reactor
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Near-threshold electron impact dissociation of H2within the adiabatic nuclei approximation
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Modeling of H2 and H2/CH4 Moderate-Pressure Microwave Plasma Used for Diamond Deposition
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Validation of actinometry for estimating relative hydrogen atom densities and electron energy evolution in plasma assisted diamond deposition reactors
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Non-Maxwellian effect on species and energy transport in moderate pressure H2 plasmas
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The integrated multiscale modeling of diamond chemical vapor deposition
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Use of a dihydrogen plasma afterglow for the reduction of zeolite-supported gold-based metallic catalysts
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