Journal de Physique III

Determination of Low-Energy Ion Implantation Damage Parameters by an Ellipsometric Method

U. Müller-Jahreis, P. Thiele, M. Bouafia and A. Seghir

J. Phys. III France, 5 5 (1995) 575-584

DOI: 10.1051/jp3:1995147

U. Müller-Jahreis

P. Thiele

M. Bouafia

A. Seghir

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