Journal de Physique III

Photoresist Development Model for Linewidth Control in the Fabrication of MCM and Customised ASICs

E. Saint-Christophe, H. Fremont, M. Fathi and Y. Danto

J. Phys. III France, 6 11 (1996) 1507-1526

DOI: 10.1051/jp3:1996199

E. Saint-Christophe

H. Fremont

M. Fathi

Y. Danto

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