Journal de Physique III

Selective and epitaxial deposition of β-FeSi₂ onto silicon by RTP-CVD

J.L. Regolini, F. Trincat, I. Berbezier, J. Palleau, J. Mercier and D. Bensahel

J. Phys. III France, 2 8 (1992) 1445-1452

DOI: 10.1051/jp3:1992189

J.L. Regolini

F. Trincat

I. Berbezier

J. Palleau

J. Mercier

D. Bensahel

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