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Cited article:

Increasing Detectivity of Polarization Modulation Infrared Reflection—Absorption Spectroscopy for the Study of Ultrathin Films Deposited on Various Substrates

J. Saccani, T. Buffeteau, B. Desbat and D. Blaudez
Applied Spectroscopy 57 (10) 1260 (2003)
https://doi.org/10.1366/000370203769699135

Sub-0.1 μm gate etch processes: Towards some limitations of the plasma technology?

L. Desvoivres, L. Vallier and O. Joubert
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 18 (1) 156 (2000)
https://doi.org/10.1116/1.591168

Electronic structure of a heterostructure of an alkylsiloxane self-assembled monolayer on silicon

D. Vuillaume, C. Boulas, J. Collet, G. Allan, and C. Delerue
Physical Review B 58 (24) 16491 (1998)
https://doi.org/10.1103/PhysRevB.58.16491

Analyses of the chemical topography of silicon dioxide contact holes etched in a high density plasma source

O. Joubert, P. Czuprynski, F. H. Bell, P. Berruyer and R. Blanc
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 15 (3) 629 (1997)
https://doi.org/10.1116/1.589305

Suppression of Charge Carrier Tunneling through Organic Self-Assembled Monolayers

C. Boulas, J. V. Davidovits, F. Rondelez and D. Vuillaume
Physical Review Letters 76 (25) 4797 (1996)
https://doi.org/10.1103/PhysRevLett.76.4797