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Cited article:

The Stress and Microstructure analysis of Polycrystalline Silicon Films Deposited by LPCVD

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MRS Proceedings 1426 263 (2012)
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Disorder effects on dielectric response of Si irradiated with Ar+

S. Tripura Sundari
Journal of Applied Physics 92 (8) 4367 (2002)
https://doi.org/10.1063/1.1465508

Ellipsometric study of the polysilicon/thin oxide/single-crystalline silicon structure and its change upon annealing

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Journal of Applied Physics 92 (5) 2374 (2002)
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Smart Materials-Fundamentals and Applications. 3D Simulation of a Shape Memory Microactuator.

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MATERIALS TRANSACTIONS 43 (5) 1030 (2002)
https://doi.org/10.2320/matertrans.43.1030

In situ measurement of the crystallization of amorphous silicon in a vertical furnace using spectroscopic ellipsometry

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Thin Solid Films 383 (1-2) 235 (2001)
https://doi.org/10.1016/S0040-6090(00)01792-2

In situ spectroscopic ellipsometry for the characterization of polysilicon formation inside a vertical furnace

P. Petrik, W. Lehnert, C. Schneider, et al.
Thin Solid Films 364 (1-2) 150 (2000)
https://doi.org/10.1016/S0040-6090(99)00935-9

Fluence dependence of the interband critical points in ion-implanted silicon

M.A El-Sherbiny, H.H El-Bahnasawy and M.M El-Ocker
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 168 (4) 510 (2000)
https://doi.org/10.1016/S0168-583X(00)00067-7

Ellipsometric study of polycrystalline silicon films prepared by low-pressure chemical vapor deposition

P. Petrik, T. Lohner, M. Fried, et al.
Journal of Applied Physics 87 (4) 1734 (2000)
https://doi.org/10.1063/1.372085

Comparative study of polysilicon-on-oxide using spectroscopic ellipsometry, atomic force microscopy, and transmission electron microscopy

P. Petrik, M. Fried, T. Lohner, et al.
Thin Solid Films 313-314 259 (1998)
https://doi.org/10.1016/S0040-6090(97)00829-8