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Cited article:
C. Flueraru , M. Gartner , D. Dascalu , C. Rotaru
J. Phys. III France, 6 2 (1996) 225-235
This article has been cited by the following article(s):
14 articles
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In situ spectroscopic ellipsometry in vertical furnace: monitoring and control of high-temperature processes
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Spectroellipsometric investigation of optical properties of SiO2 grown by wet thermal oxidation
C Flueraru, M Gartner, O Buiu, et al. Surface Science 482-485 448 (2001) https://doi.org/10.1016/S0039-6028(00)01037-2
In situ measurement of the crystallization of amorphous silicon in a vertical furnace using spectroscopic ellipsometry
P. Petrik, W. Lehnert, C. Schneider, et al. Thin Solid Films 383 (1-2) 235 (2001) https://doi.org/10.1016/S0040-6090(00)01792-2
In situ spectroscopic ellipsometry for the characterization of polysilicon formation inside a vertical furnace
P. Petrik, W. Lehnert, C. Schneider, et al. Thin Solid Films 364 (1-2) 150 (2000) https://doi.org/10.1016/S0040-6090(99)00935-9
Fluence dependence of the interband critical points in ion-implanted silicon
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Ellipsometric study of polycrystalline silicon films prepared by low-pressure chemical vapor deposition
P. Petrik, T. Lohner, M. Fried, et al. Journal of Applied Physics 87 (4) 1734 (2000) https://doi.org/10.1063/1.372085
Amorphous Phase Influence on the Optical Bandgap of Polysilicon
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Comparative study of polysilicon-on-oxide using spectroscopic ellipsometry, atomic force microscopy, and transmission electron microscopy
P. Petrik, M. Fried, T. Lohner, et al. Thin Solid Films 313-314 259 (1998) https://doi.org/10.1016/S0040-6090(97)00829-8
C. Rotaru, C. Flueraru, S. Nastase and I. Rotaru 2 447 (1997) https://doi.org/10.1109/SMICND.1997.651243