| Numéro |
J. Phys. III France
Volume 5, Numéro 9, September 1995
|
|
|---|---|---|
| Page(s) | 1455 - 1467 | |
| DOI | https://doi.org/10.1051/jp3:1995203 | |
DOI: 10.1051/jp3:1995203
J. Phys. III France 5 (1995) 1455-1467
Laboratoire IXL, 351 cours de La Libération, 33405 Talence Cedex, France
© Les Editions de Physique 1995
J. Phys. III France 5 (1995) 1455-1467
Laser Beam Lithography for Direct Patterning of Interconnections on Prediffused ASIC's
A. Fleury, E. Saint-Christophe, H. Frémont, M. Fathi, G. N'Kaoua and Y. DantoLaboratoire IXL, 351 cours de La Libération, 33405 Talence Cedex, France
(Received 27 December 1994, revised 15 March 1995, accepted 19 June 1995)
Abstract
A lithography machine designed for laser direct writing of metawsation in ASIC's and MCM, and the associated practical process
are described. To demonstrate the feasibility of the laser direct writing, the last level of metallisation on a bipolar ASIC
has been drawn. The design rules have been calculated using a theoretical modelling of the interaction between laser beam
and photoresists. Calculation and experiment are in good agreement for two kinds of photoresists.
© Les Editions de Physique 1995