J. Phys. III France
Volume 5, Numéro 10, October 1995
Page(s) 1491 - 1499
DOI: 10.1051/jp3:1995206
J. Phys. III France 5 (1995) 1491-1499

Electrochromic NiO x Film by DC Sputtering

Xu Yanzhong, Qiu Muqing, Qiu Sichou, Dai Jing, Hunag Hanrou and Cao Guangjun

Dept. of Solid State Electronics, Huazhong University of Science & Technology, Wuhan, Hubei, P.R.C., China

(Received 11 October 1994, revised 3 April 1995, accepted 28 June 1995)

DC sputtering technique was applied to prepare NiO x film, in which nickel hydroxide was used directly as the target. XRD and SEM examination show that the film is uniform and full of small granules of almost the same size. Slight difference exists between the as-deposited film and the colored film. Some weak crystal peaks appear in the latter film. The film has good electrochromic property. The content of oxygen in the vacuum chamber has no obvious effect on the electrochromic property of the film. XPS was used to investigate the nickel atomic state in the film. The result shows that Ni 2+ is oxided into Ni 3+ with coloring. The transmittance of the film can vary from 5% to 74% in the visible range.

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