J. Phys. III France
Volume 5, Numéro 2, February 1995
Page(s) 197 - 202
DOI: 10.1051/jp3:1995119
J. Phys. III France 5 (1995) 197-202

Jumps and Hysteresis Effects in $\mathsf{CH_{4}}$- $\mathsf{H_{2}}$ Plasma Discharges

Ru-Juan Zhan1, 2 and Xi-Cheng Jiang1

1  Department of Modern Physics, University of Science and Technologie of China
2  Structure Research Laboratory, Chinese Academy of Science, Hefei, Anhui 230026, P.R. China

(Received 30 May 1994, revised 2 September 1994 and 2 November 1994, accepted 10 November 1994)

In typical conditions of diamond film synthesis in a EACVD device (Electron-Assisted Chemical Vapor Deposition), we report on the sudden jumps, bistability, multistability and negative resistance phenomena in methane-hydrogen mixture discharge plasma. We studied the variations of these phenomena with gas pressure, filament current. The difference of discharge characteristic between pure hydrogen and methane-hydrogen mixture system is presented.

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