Numéro |
J. Phys. III France
Volume 4, Numéro 9, September 1994
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Page(s) | 1543 - 1557 | |
DOI | https://doi.org/10.1051/jp3:1994221 |
J. Phys. III France 4 (1994) 1543-1557
X-ray diffuse scattering as a probe for thin film and interface structure
S. K. SinhaExxon Research and Engineering Company, Corporate Research, Route 22 East, Annandale, NJ 08801, U.S.A.
(Received 19 November 1993, revised 10 March 1994, accepted 30 March 1994)
Abstract
The structure of thin films and interfaces can be probed by X-ray specular and off-specular (diffuse) scattering. As is well-known,
the former yields the average density profile across the film or interface. Diffuse scattering as treated here is the analogue (for interfaces) of small-angle
scattering from bulk materials, but with the ability to probe much larger length-scales. We shall discuss how the diffuse
scattering yields information regarding the detailed morphology of the interface roughness, the conformality of the roughness
between successive interfaces, the morphology of the erosion or pit-structure shall illustrate with results on several systems
studied using synchrotron radiation at the National Synchrotron Light Source.
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