Numéro
J. Phys. III France
Volume 4, Numéro 9, September 1994
Page(s) 1543 - 1557
DOI https://doi.org/10.1051/jp3:1994221
DOI: 10.1051/jp3:1994221
J. Phys. III France 4 (1994) 1543-1557

X-ray diffuse scattering as a probe for thin film and interface structure

S. K. Sinha

Exxon Research and Engineering Company, Corporate Research, Route 22 East, Annandale, NJ 08801, U.S.A.

(Received 19 November 1993, revised 10 March 1994, accepted 30 March 1994)

Abstract
The structure of thin films and interfaces can be probed by X-ray specular and off-specular (diffuse) scattering. As is well-known, the former yields the average density profile across the film or interface. Diffuse scattering as treated here is the analogue (for interfaces) of small-angle scattering from bulk materials, but with the ability to probe much larger length-scales. We shall discuss how the diffuse scattering yields information regarding the detailed morphology of the interface roughness, the conformality of the roughness between successive interfaces, the morphology of the erosion or pit-structure shall illustrate with results on several systems studied using synchrotron radiation at the National Synchrotron Light Source.



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