Limitations on AES quantitative analyses of plasma deposited ceramics p. 1373 B. Cros, R. Berjoan, C. Monteil, E. Gat, N. Azema, D. Perarnau and J. Durand DOI: https://doi.org/10.1051/jp3:1992183 PDF (332.7 KB)References
CVD of BaF2 with new stable and volatile complexes of barium(II) p. 1381 D.G. Gilliland, M.L. Hitchman, S.C. Thompson and D.J. Cole-Hamilton DOI: https://doi.org/10.1051/jp3:1992179 PDF (456.4 KB)References
Plasma depostion of BN, BCN:H and Me-BCN:H films using N-trimethylborazine (Me = Ti, Nb) p. 1391 A. Weber, U. Bringmann, C.P. Klages, K. Taube, G. Döllein, H. Meyer and G. Weidenbach DOI: https://doi.org/10.1051/jp3:1992184 PDF (488.7 KB)References
Safety and environmental aspects of CVD p. 1399 Richard H. Walling and Rodney H. Moss DOI: https://doi.org/10.1051/jp3:1992104 PDF (765.9 KB)References
Chemical vapour deposition of very thin coatings on carbon fibre bundles p. 1413 T. Stumm, E. Fitzer and G. Wahl DOI: https://doi.org/10.1051/jp3:1992185 PDF (452.6 KB)References
Remote plasma chemical vapour deposition of silicon nitride films p. 1421 S.E. Alexandrov and A. Yu. Kovalgin DOI: https://doi.org/10.1051/jp3:1992186 PDF (361.9 KB)References
Mechanisms and rate determining steps in plasma induced high rate CVD of silicon an germanium: similarities and differences p. 1431 S. Vepřek, M.G.J. Vepřek-heijman, O. Ambacher, M. Rückschloss, F. Glatz and R. Konwitschny DOI: https://doi.org/10.1051/jp3:1992187 PDF (426.3 KB)References
Synthesis and properties of highly c-axis oriented PbTiO3 thin films prepared by and MOCVD method p. 1439 Xian-tong Chen, Hisanori Yamane and Kiyoshi Kaya DOI: https://doi.org/10.1051/jp3:1992188 PDF (286.4 KB)References
Selective and epitaxial deposition of β-FeSi2 onto silicon by RTP-CVD p. 1445 J.L. Regolini, F. Trincat, I. Berbezier, J. Palleau, J. Mercier and D. Bensahel DOI: https://doi.org/10.1051/jp3:1992189 PDF (482.0 KB)References
Black tungsten selective optical coatings for photothermal solar energy conversion p. 1453 K.A. Gesheva, D.S. Gogova and G. Stoyanov DOI: https://doi.org/10.1051/jp3:1992190 PDF (340.7 KB)References
Plasma diagnostics of rf discharges used for the deposition of hydrogenated amorphous carbon coatings p. 1461 J. Smeets, V. Van den Bergh, R. Jacobs, L. Eersels, J. Meneve and E. Dekempeneer DOI: https://doi.org/10.1051/jp3:1992191 PDF (396.3 KB)References
Free Access Erratum Erratum: Composition oscillations in hard material layers deposited from the vapour phase p. 1469 K. Bartsch, A. Leonhardt and E. Wolf DOI: https://doi.org/10.1051/jp3:1992192 PDF (12.23 KB)
An exact analytical model for predicting electromagnetic fields produced by current transients p. 1473 R. S. Shi, J. C. Sabonnadière and A. Darcherif DOI: https://doi.org/10.1051/jp3:1992193 PDF (269.8 KB)References
Comparative internal friction and modulus evolutions in Ni-Ti and Ni-Ti-Cu shape memory alloys p. 1479 K. Goubaa, M. Masse and G. Bouquet DOI: https://doi.org/10.1051/jp3:1992194 PDF (605.9 KB)References
Effet Bauschinger lors de la plasticité cyclique de l'aluminium pur monocristallin p. 1491 A. Alhamany, J. Chicois, R. Fougères and A. Hamel DOI: https://doi.org/10.1051/jp3:1992195 PDF (1.399 MB)References
Génération d'ondes acoustiques dans le silicium par faisceau d'électrons ou laser modulé p. 1509 D. Marty-Dessus, M. Ez Zejjari, N. Boughanmi, J. Boucher and J. L. Franceschi DOI: https://doi.org/10.1051/jp3:1992196 PDF (730.1 KB)References
Etude d'un invariant permettant de caractériser un faisceau laser : application à une source YAG-Nd de forte puissance p. 1527 K. F. Badawi, H. Andrzejewski, D. Grevey and J. L. Guyot DOI: https://doi.org/10.1051/jp3:1992197 PDF (802.8 KB)References
Particularities of overdetermined linear systems arising in particle size analysis p. 1547 D. M. Calistru, R. Mondescu and I. Baltog DOI: https://doi.org/10.1051/jp3:1992198 PDF (365.6 KB)References
