Journal de Physique III

Limitations on AES quantitative analyses of plasma deposited ceramics p. 1373

B. Cros, R. Berjoan, C. Monteil, E. Gat, N. Azema, D. Perarnau et J. Durand

DOI: https://doi.org/10.1051/jp3:1992183

CVD of BaF₂ with new stable and volatile complexes of barium(II) p. 1381

D.G. Gilliland, M.L. Hitchman, S.C. Thompson et D.J. Cole-Hamilton

DOI: https://doi.org/10.1051/jp3:1992179

Plasma depostion of BN, BCN:H and Me-BCN:H films using N-trimethylborazine (Me = Ti, Nb) p. 1391

A. Weber, U. Bringmann, C.P. Klages, K. Taube, G. Döllein, H. Meyer et G. Weidenbach

DOI: https://doi.org/10.1051/jp3:1992184

Safety and environmental aspects of CVD p. 1399

Richard H. Walling et Rodney H. Moss

DOI: https://doi.org/10.1051/jp3:1992104

Chemical vapour deposition of very thin coatings on carbon fibre bundles p. 1413

T. Stumm, E. Fitzer et G. Wahl

DOI: https://doi.org/10.1051/jp3:1992185

Remote plasma chemical vapour deposition of silicon nitride films p. 1421

S.E. Alexandrov et A. Yu. Kovalgin

DOI: https://doi.org/10.1051/jp3:1992186

Mechanisms and rate determining steps in plasma induced high rate CVD of silicon an germanium: similarities and differences p. 1431

S. Vepřek, M.G.J. Vepřek-heijman, O. Ambacher, M. Rückschloss, F. Glatz et R. Konwitschny

DOI: https://doi.org/10.1051/jp3:1992187

Synthesis and properties of highly c-axis oriented PbTiO₃ thin films prepared by and MOCVD method p. 1439

Xian-tong Chen, Hisanori Yamane et Kiyoshi Kaya

DOI: https://doi.org/10.1051/jp3:1992188

Selective and epitaxial deposition of β-FeSi₂ onto silicon by RTP-CVD p. 1445

J.L. Regolini, F. Trincat, I. Berbezier, J. Palleau, J. Mercier et D. Bensahel

DOI: https://doi.org/10.1051/jp3:1992189

Black tungsten selective optical coatings for photothermal solar energy conversion p. 1453

K.A. Gesheva, D.S. Gogova et G. Stoyanov

DOI: https://doi.org/10.1051/jp3:1992190

Plasma diagnostics of rf discharges used for the deposition of hydrogenated amorphous carbon coatings p. 1461

J. Smeets, V. Van den Bergh, R. Jacobs, L. Eersels, J. Meneve et E. Dekempeneer

DOI: https://doi.org/10.1051/jp3:1992191

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Erratum

Erratum: Composition oscillations in hard material layers deposited from the vapour phase p. 1469

K. Bartsch, A. Leonhardt et E. Wolf

DOI: https://doi.org/10.1051/jp3:1992192

An exact analytical model for predicting electromagnetic fields produced by current transients p. 1473

R. S. Shi, J. C. Sabonnadière et A. Darcherif

DOI: https://doi.org/10.1051/jp3:1992193

Comparative internal friction and modulus evolutions in Ni-Ti and Ni-Ti-Cu shape memory alloys p. 1479

K. Goubaa, M. Masse et G. Bouquet

DOI: https://doi.org/10.1051/jp3:1992194

Effet Bauschinger lors de la plasticité cyclique de l'aluminium pur monocristallin p. 1491

A. Alhamany, J. Chicois, R. Fougères et A. Hamel

DOI: https://doi.org/10.1051/jp3:1992195

Génération d'ondes acoustiques dans le silicium par faisceau d'électrons ou laser modulé p. 1509

D. Marty-Dessus, M. Ez Zejjari, N. Boughanmi, J. Boucher et J. L. Franceschi

DOI: https://doi.org/10.1051/jp3:1992196

Etude d'un invariant permettant de caractériser un faisceau laser : application à une source YAG-Nd de forte puissance p. 1527

K. F. Badawi, H. Andrzejewski, D. Grevey et J. L. Guyot

DOI: https://doi.org/10.1051/jp3:1992197

Particularities of overdetermined linear systems arising in particle size analysis p. 1547

D. M. Calistru, R. Mondescu et I. Baltog

DOI: https://doi.org/10.1051/jp3:1992198