Characterization of thin films and multilayers by specular X-ray reflectivity

(Received 19 November 1993, revised 9 March 1994, accepted 26 April 1994)

Abstract
The application of glancing incidence X-ray reflectivity measurements for the investigation of submicrometer thick layers and multilayer stacks which are produced in modern technology processes is discussed. We describe different setups for X-ray reflectivity measurements and computer methods which allow the extraction of various layer parameters from the experimental data.