| Issue |
J. Phys. III France
Volume 4, Number 9, September 1994
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|
|---|---|---|
| Page(s) | 1503 - 1511 | |
| DOI | https://doi.org/10.1051/jp3:1994303 | |
DOI: 10.1051/jp3:1994212
J. Phys. III France 4 (1994) 1503-1511
Forschungsinstitut für Optoelektronik, Johannes-Kepler-Universität Linz, AltenbergerstraBe 69, A-4040 Linz-Auhof, Austria
© Les Editions de Physique 1994
J. Phys. III France 4 (1994) 1503-1511
Characterization of thin films and multilayers by specular X-ray reflectivity
W. M. Plotz and K. LischkaForschungsinstitut für Optoelektronik, Johannes-Kepler-Universität Linz, AltenbergerstraBe 69, A-4040 Linz-Auhof, Austria
(Received 19 November 1993, revised 9 March 1994, accepted 26 April 1994)
Abstract
The application of glancing incidence X-ray reflectivity
measurements for the investigation of submicrometer thick layers
and multilayer stacks which are produced in modern technology
processes is discussed. We describe different setups for X-ray
reflectivity measurements and computer methods which allow the
extraction of various layer parameters from the experimental data.
© Les Editions de Physique 1994