J. Phys. III France
Volume 4, Numéro 9, September 1994
Page(s) 1503 - 1511
DOI: 10.1051/jp3:1994212
J. Phys. III France 4 (1994) 1503-1511

Characterization of thin films and multilayers by specular X-ray reflectivity

W. M. Plotz and K. Lischka

Forschungsinstitut für Optoelektronik, Johannes-Kepler-Universität Linz, AltenbergerstraBe 69, A-4040 Linz-Auhof, Austria

(Received 19 November 1993, revised 9 March 1994, accepted 26 April 1994)

The application of glancing incidence X-ray reflectivity measurements for the investigation of submicrometer thick layers and multilayer stacks which are produced in modern technology processes is discussed. We describe different setups for X-ray reflectivity measurements and computer methods which allow the extraction of various layer parameters from the experimental data.

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